ultraviolet lithography meaning in English
紫外线光刻
Examples
- Euv extreme ultraviolet lithography
极端紫外平版印刷 - Some of the techniques ( for example , advanced ultraviolet lithography for chip production ) will probably become commercial realities
某些技术，例如拿来生产晶片的高阶紫外光蚀刻法，很可能会受到业者广泛使用。 - Silicon grating is a period construction fabricated on the silicon wafer by micro fabrication techniques as ultraviolet lithography and anisotropic etching
硅光栅是利用紫外光刻、各向异性腐蚀等硅微加工技术在硅片上制作的周期结构。 - Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o . lum - pattern . in recent years , several key technologies have been developed rapidly such as laser producing plasma source , extreme ultraviolet multilayer , optical fabrication and metrology , projection - camara alignment , low - defect mask and control technology of stage
极紫外投影光刻( extremeultravioletlithography简称euvl )最有可能成为下一世纪生产线宽小于0 . 1 m集成电路的技术，近年来在激光等离子体光源、极紫外多层膜、光学加工和检测、光学精密装调、低缺陷掩模、光刻胶技术以及高稳定工作台系统控制等关键技术方面得到了飞速发展。 - Extreme ultraviolet lithography ( euvl ) represents one of the promising technologies for supporting integrated circuit ( 1c ) industry ' s lithography needs during the first decade of the 21st century . this technology builds on conventional optical lithography experience and infrastructure , uses 11 - to 14 - nm photon illumination , and is expected to support multiple technology generation from 65 nm to 35 nm
极紫外投影光刻( euvl ， extremeultravioletlithography )技术作为下一代光刻技术中最佳候选技术，建立于可见/紫外光学光刻的诸多关键单元技术基础之上，工作波长为11 14nm ，适用于制造特征尺寸为65 35nm的数代超大规模集成电路，预计在2006年将成为主流光刻技术。